abstract |
The present invention provides a resist composition that exhibits high sensitivity, is excellent in storage stability, and has good lithography properties, and a method for forming a resist pattern. A resist composition that generates an acid upon exposure and changes its solubility in a developer by the action of an acid, the substrate component (A) having a change in solubility in a developer by the action of an acid; A resist composition comprising a nitrogen-containing compound (N) having a boiling point of 50 to 200 ° C. and a pKa of the conjugate acid of 0 to 7, and a photobase deactivator (D1), and A resist pattern forming method using the same. [Selection figure] None |