| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-773 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2011-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013534944-A |
| titleOfInvention |
Cross-linked and multi-phase etching pastes for high resolution feature patterning |
| abstract |
The present invention is a novel in the form of a printable and homogeneous etch paste that has non-Newtonian flow for improved etching of inorganic oxides and silicon surfaces, allowing smaller features to be produced. The present invention relates to an etching medium. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022024638-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017216444-A |
| priorityDate |
2010-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |