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filingDate 2011-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013533035-A
titleOfInvention Surface treatment method for fluid administration device
abstract A surface treatment method for a fluid administration device, comprising: changing a surface of at least a part of at least a part of the fluid administration device by ion implantation using a multi-charged and multi-energy ion beam. The surface to be treated after being formed has a friction reducing characteristic, and the multiply charged ions are helium (He), nitrogen (N), oxygen (O), neon (Ne), argon (Ar), krypton (Kr). ), A surface treatment method in which xenon (Xe) is selected and ion implantation is performed to a depth of 0 μm to 3 μm. [Selection] Figure 3
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