http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013239667-A
Outgoing Links
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|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
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| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3177 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-317 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J3-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-305 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cc5d2d1a8c58033413f1bd8baefca15 |
| publicationDate | 2013-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013239667-A |
| titleOfInvention | Electrode in charged particle beam electrostatic lens and manufacturing method thereof, charged particle beam electrostatic lens, and charged particle beam exposure apparatus |
| abstract | A charged particle beam electrostatic lens and the like that can eliminate notching due to dry etching and that can be processed with high accuracy are provided. An electrode in a charged particle beam electrostatic lens in which a plurality of conductive substrates are laminated to form a single laminated electrode, wherein the laminated electrode has a first through hole at least. The conductive substrate 12 and the second conductive substrate 11 having the second through hole, and the first conductive substrate is a conductive substrate having a thickness smaller than that of the second conductive substrate. A first through hole having a diameter smaller than that of the second through hole is provided, and the second conductive substrate has a specific resistance lower than that of the first conductive substrate and a thick plate. A hole having a diameter larger than that of the first through hole provided in the conductive substrate is filled with plating to thin the conductive substrate, whereby the first hole having a diameter larger than that of the first through hole is formed. Two through-holes, the first and second through-holes are aligned and stacked, and the laminated electrode 10 It is configured. [Selection] Figure 1 |
| priorityDate | 2012-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449266279 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15913 |
Total number of triples: 28.