| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d7819b821f9836ad2b7fd8b4efeb2943 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2013-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8d178f2262bc7461a53ff2a40a93ce4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf6661e289fc1caac5882a4ae00a86da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86e5ad8b58b22341d39e8fab22ffec67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a74b7eedad5c9a30c3bbe5b49b0f3ad2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9774d17dd2c140c69bdbfe3b04c454aa |
| publicationDate |
2013-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013219361-A |
| titleOfInvention |
Polishing slurry composition |
| abstract |
A polishing slurry composition that effectively suppresses dishing caused by chemical mechanical polishing is provided. A polishing slurry composition comprising a nonionic surfactant represented by the following formula (1) is provided. In the formula (1), x is an integer of 1 to 50. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018512475-A |
| priorityDate |
2012-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |