http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013209558-A

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filingDate 2012-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aff7ec0edd1248648f99a198201df516
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publicationDate 2013-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013209558-A
titleOfInvention Thin film formation method
abstract To provide a thin film forming method capable of forming a thin film having a high altitude without performing high-temperature firing. A coating liquid containing metal oxide particles and peroxotitanic acid is coated on a substrate to form a coating film, and the coating film is subjected to plasma treatment, ultraviolet light irradiation treatment, and visible light irradiation treatment. A method of forming a thin film, comprising performing at least one treatment selected from the group consisting of: The metal oxide particles are preferably one or more particles selected from the group consisting of titanium oxide, tungsten oxide, zinc oxide, tin oxide, hafnium oxide, zirconium oxide, and niobium oxide. The plasma treatment is preferably an atmospheric pressure plasma treatment or a low vacuum plasma treatment. [Selection] Figure 1
priorityDate 2012-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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