| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2dcebf5a7f7ddc3b081f70e8ce1c4097 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C9-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C9-04 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22F1-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C9-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C9-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-02 |
| filingDate |
2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39f48f871fcdbb6bfbe503e3a45d4460 |
| publicationDate |
2013-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013204083-A |
| titleOfInvention |
Copper alloy sheet for electrical and electronic parts with excellent bending workability and stress relaxation resistance |
| abstract |
Provided is a copper alloy plate for electrical and electronic parts that uses a Cu-Ni-Si based copper alloy and is excellent in both bending workability and stress relaxation resistance. SOLUTION: Ni: 1.5-4.0 mass%, Si with a Ni / Si mass ratio of 4.0-5.0, and Sn: 0.01-1.3 mass%, with the balance being copper and It is made of a copper alloy composed of unavoidable impurities, has an average crystal grain size of 5 to 20 μm, a standard deviation of crystal grain size of 2σ <10 μm, and is observed in a cross section composed of a plate surface perpendicular to the rolling direction and parallel to the rolling direction. Among the Ni-Si dispersed particles having a particle size of 30 to 300 nm, the ratio of the number of particles having a particle size of 90 to 300 nm is 20% or more. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016186107-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107429328-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107429328-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170130514-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016158390-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102226988-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102075892-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015125927-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10233517-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170130517-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190043583-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015155560-A |
| priorityDate |
2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |