http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013203782-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L75-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 |
filingDate | 2012-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de166b097fddc609836522558b7d558a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a0ec02a19d4e876cecfe9458181d961 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7cedac6f4c46d71fab081d00333c328 |
publicationDate | 2013-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013203782-A |
titleOfInvention | Composition, polishing pad and method for producing the composition |
abstract | 【Task】 To provide a composition having a high elongation and a method for producing the same, and a polishing pad with fewer defects on the wafer surface and a longer pad life. [Solution] A composition comprising a polymer polymerized from an ethylenically unsaturated compound and polyurethane, and a compound represented by the formula (1) as the ethylenically unsaturated compound. [Chemical 1] (R 1 and R 3 are hydrogen, R 2 is hydrogen or an alkyl group, and R 4 is an organic group containing a structure in which six or more carbon atoms and / or oxygen atoms are connected in a straight chain.) [Selection figure] None |
priorityDate | 2012-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 213.