| abstract |
A problem to be solved is to provide a polyurethane resin composition for a polishing pad, a polyurethane polishing pad and a method for producing the same, which are excellent in high polishing rate and scratch resistance. A main component (i) containing a urethane prepolymer (A) having an isocyanate group obtained by reacting a polyol composition (a-1) and a polyisocyanate (a-2), and isocyanate group reactivity. A polyurethane resin composition for a polishing pad containing a curing agent (ii) containing a compound (B), wherein the polyol composition (a-1) is obtained by refining cellulose in a polyol. A polyurethane resin composition for a polishing pad, comprising nanofibers. [Selection figure] None |