http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013187401-A

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filingDate 2012-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38b468053ff47004ce0368035dbab342
publicationDate 2013-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013187401-A
titleOfInvention Substrate processing apparatus and substrate processing method
abstract Disclosed is a surface active agent that has little variation in finish and can prevent contamination by particles floating on a processing liquid surface. A control unit 45 supplies a processing liquid to an inner tank 3, positions a substrate W at a processing position, and causes the substrate W to perform processing using the processing liquid. The controller 45 drops the surfactant from the dropping nozzle 35 onto the processing liquid surface when raising the lifter 27 to the pulling position. The particles are attracted to a region having a large surface tension and discharged to the outside by the surface diffusing action of the surfactant. Thereafter, by raising the lifter 27 to the lifting position, the substrate W is lifted up from the processing liquid surface from which particles are almost removed, so that contamination of the substrate W by particles floating on the processing liquid surface can be prevented. Further, since the surfactant is only dropped before the substrate W is pulled up, it is difficult to affect the treatment with the treatment liquid, and the variation in the finish can be reduced. [Selection] Figure 1
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priorityDate 2012-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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