http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013175747-A

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filingDate 2013-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd443b12256e2f7182d3f073667e6898
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publicationDate 2013-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013175747-A
titleOfInvention Crystalline oxide semiconductor and thin film transistor using the same
abstract A crystalline oxide semiconductor having a low carrier concentration, a high hole mobility, and a large energy band gap is provided. In a radial distribution function (RDF) that includes indium and one or more metal elements M and is determined by X-ray absorption spectroscopy, the maximum RDF with an interatomic distance between 0.3 nm and 0.36 nm is obtained. When the value is A and the maximum value of RDF between the atomic distances of 0.1 nm to 0.2 nm is B, the relationship of 0.1 <A / B <1 is satisfied and a bixbite type crystal structure is shown. A crystalline oxide semiconductor, which is a polycrystalline oxide. [Selection figure] None
priorityDate 2013-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000330134-A
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