http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013151052-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B26D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2012-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dd0d260d7c9be2636bbe3a0e3a0faa9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_072856ba93c4ec9450ddbbcd8c417dc1 |
| publicationDate | 2013-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013151052-A |
| titleOfInvention | Manufacturing method of polishing pad material |
| abstract | In a manufacturing method of a material for a polishing pad used for forming a flat surface in glass, semiconductor, dielectric / metal composite, integrated circuit, etc., the thickness accuracy of a sliced sheet is improved and a raw material block is improved. A method for improving the number of polishing pad material sheets obtained by slicing is provided. A method of manufacturing a polishing pad material by slicing a raw material block with a slicer, wherein the slicing step has a Shore D hardness of 40 to 70 and a thickness of 15 mm to 30 mm. Are first sliced into two in the thickness direction, and then sliced into a sheet having a thickness of 1 mm to 3 mm. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015051489-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023042280-A1 |
| priorityDate | 2012-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.