| abstract |
PROBLEM TO BE SOLVED: To provide an imprint apparatus for reducing a change in composition of an imprint material containing a plurality of components supplied on a substrate. An imprint apparatus according to the present invention contacts a mold on which a pattern is formed and an imprint material composed of a plurality of components supplied onto a substrate, and cures the imprint material, thereby forming a pattern. An imprint apparatus for transferring to an imprint material, a supply unit for supplying a gas containing a plurality of components among components included in the imprint material onto a substrate to which the imprint material is supplied, and an imprint material And an acquisition unit that acquires data representing the ratio of the contained components, and the ratio of the gas component supplied by the supply unit is determined from the data representing the acquired ratio. [Selection] Figure 2 |