http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013125121-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_203c4e4b9677c902919ad91d5fbb585e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-147 |
| filingDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbe19fafe4edaadc9b9c99283fa419ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23852924de6e4715d00e95fb7819da0d |
| publicationDate | 2013-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013125121-A |
| titleOfInvention | Light irradiation apparatus and method for producing electrophotographic organic photoreceptor |
| abstract | PROBLEM TO BE SOLVED: To provide a light irradiation apparatus and a method for producing an electrophotographic organic photoreceptor capable of forming a protective layer having high durability, in which an uncured film is uniformly cured. SOLUTION: A method for producing an electrophotographic organic photoreceptor through a step of irradiating light to an uncured film formed on an organic photosensitive layer on a conductive support to form a protective layer made of a cured resin. In addition, a light exit window for emitting light radially inward is provided in a state surrounding the periphery of the work conveyance path space extending in the vertical direction, and a gas discharge port for discharging nitrogen gas radially inward Using a light irradiation device provided at a level position lower than the level position where the exit window is provided, a workpiece having an uncured film formed on the organic photosensitive layer is moved upward with the cylindrical axis extending vertically. The curing process of irradiating light from the light exit window in a state where nitrogen gas is supplied from the gas discharge port while being conveyed toward the substrate is performed in a state where the workpiece is rotated about the axis. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015052728-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014077898-A |
| priorityDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 149.