http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013115274-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6ba4f97b8fa68da65a8b56ea14e1d88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29c9bfda958d8bd373e5d0f9cc494aec |
| publicationDate | 2013-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013115274-A |
| titleOfInvention | Semiconductor device manufacturing method, developing device, and semiconductor device |
| abstract | In development processing of a photoresist formed on an organic antireflection film, reaction products generated by the reaction between the photoresist and a developer are appropriately removed in a short time without damaging the resist pattern. The development process of a photoresist includes a first step of developing with a developer and removing the developer, and a second step of developing with a developer and removing the developer after the first step. The resist pattern is formed by a second step. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016225529-A |
| priorityDate | 2011-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.