| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2011-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4188153274e5fbf3d506e52e008b35fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 |
| publicationDate |
2013-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013083821-A |
| titleOfInvention |
Resist protective film material and pattern forming method |
| abstract |
Provided is a resist protective film material that reduces the influence of a resist film from the environment, efficiently blocks OOB light, reduces the number of resist patterns and bridges between patterns, and increases the sensitivity of the resist. A resist protective film is formed from a resist protective film material on a photoresist film formed on a wafer. After performing exposure, the resist protective film is peeled off and the photoresist film is developed. A resist protective film material used in a method for forming a pattern on a photoresist film, the resist protective film material including a torquesen compound containing a phenol group represented by the following general formula (1). [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014142296-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9250518-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9482952-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013083833-A |
| priorityDate |
2011-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |