http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013082614-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1229111a198f86af4112ecd730b55cd9 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B31-10 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-035 |
filingDate | 2012-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29168c1c4725f01b1663dd3f27d067e9 |
publicationDate | 2013-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013082614-A |
titleOfInvention | Apparatus and method for depositing polycrystalline silicon |
abstract | Polycrystalline rods from high-purity silicon with a low proportion of rough surfaces are produced more economically. An apparatus for depositing polycrystalline silicon comprising a reactor chamber having a reactor wall, at least 20 filament rods, and a gas inlet for a reactive gas within the reactor chamber. Each filament rod, with the exception of the filament rod near the reactor wall, with another three adjacent filament rods and one to three adjacent gas uptakes at intervals of 150-450 mm This is solved by an apparatus for depositing polycrystalline silicon in which a mouth is present. [Selection figure] None |
priorityDate | 2011-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.