http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013075843-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27ce997496ad602504ce5bcdd2f965aa |
| publicationDate | 2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013075843-A |
| titleOfInvention | Compound, polymer and photoresist composition |
| abstract | A compound used for forming a resist film excellent in nano edge roughness, resolution, pattern collapse resistance, and MEEF (Mask Error Enhancement Factor) in addition to basic performance such as sensitivity, and a polymer obtained using the compound And a photoresist composition containing the polymer. A compound represented by the following formula (1): (In Formula (1), R 1 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R 2 is a single bond or a divalent linking group. M + is a monovalent cation. In addition, the monovalent cation of M + in the formula (1) is preferably a sulfonium such as 4-cyclohexylthiophenyl diphenylsulfonium. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I564282-B |
| priorityDate | 2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 400.