http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013068851-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_749d48f19b19df8fd80958517557e671 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f1784d8d5536c8f0a015741a46eecbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f755c300b2571521cc9151a64d85c60 |
| publicationDate | 2013-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013068851-A |
| titleOfInvention | Resist composition and resist pattern forming method |
| abstract | A resist composition and a resist pattern forming method are provided. A resist containing a base component (A) whose solubility in an alkali developer is increased by the action of an acid, a photobase generator component (C) which generates a base upon exposure, and an acidic compound component (G). A step (1) of applying a composition to form a resist film, a step (2) of exposing, a baking, and a base generated from the photobase generator component (C) and an acidic compound component ( G) is neutralized, and the step (3) of increasing the solubility of the base component (A) in the alkaline developer by the action of the acidic compound component (G) in the unexposed area, the alkali development, and the unexposed area The resist composition used in the step (1) of the resist pattern forming method including the step (4) of forming a negative pattern in which is dissolved and removed, wherein the acidic compound component (G) has a pKa of 7 or less Nitrogen-containing click Containing compounds consisting of emissions and a counter anion of (G1). [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013109279-A |
| priorityDate | 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 369.