http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013068796-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
filingDate | 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf6c7439a8cc1c8281484011b80e12b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b976950ff5ed792ad7d4f68b89cb344c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f2053be723a5329e3d7a9c3d3aa07f4 |
publicationDate | 2013-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2013068796-A |
titleOfInvention | Relief pattern manufacturing method |
abstract | Provided is a relief pattern manufacturing method capable of forming a fine pattern of low line edge roughness with high resolution and suppressing pattern collapse. (I) One or more substituents selected from the group consisting of a hydroxymethyl group and an alkoxymethyl group at the ortho position of the phenolic hydroxyl group having two or more phenolic hydroxyl groups in one molecule. A negative resist composition containing 70 wt% or more of a phenolic compound (A) having a molecular weight of 400 to 2500 in one molecule and having a molecular weight of 400 to 2500 in the total solid content of the negative resist composition was applied on a substrate. And (ii) exposing the pre-exposure resist film in a pattern with an electron beam, ion beam, EUV, or X-ray to form a post-exposure resist film. And (iii) a step of developing the post-exposure resist film using an organic solvent, wherein the organic solvent has a dissolution rate of 23 nm of the pre-exposure resist film at 0.5 nm / se. It is more than an alcohol solvent containing no hetero atoms other than a hydroxyl group, a method for producing a relief pattern. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016132767-A |
priorityDate | 2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 478.