| abstract |
Provided is a method for manufacturing a substrate with a metal film pattern having a pattern size smaller than a concave size of a concave-convex pattern formed on the surface of a mold while maintaining a good pattern shape. A method of manufacturing a metal film pattern according to the present invention includes a metal film, a photoreactive adhesive layer on the metal film, and a resist film mainly composed of a hydrophobic polymer made of a thermoplastic resin. Are formed in this order, and the concavo-convex pattern of the mold 50 is transferred to the resist film 40 to form a resist film pattern 41. Next, after the residue treatment, the exposed metal film 20 is wet-etched using the resist film pattern 41 to form a metal film pattern. And the metal film pattern 21 of the pattern size reduced rather than the size of the recessed part of the mold 50 is obtained by performing the side etching of a metal film pattern. [Selection] Figure 3G |