http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013052361-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G9-08 |
| filingDate | 2011-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f807849219a31c21419f0c652766a9b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9de2c189ef2db91bfe6790cdf5d9777 |
| publicationDate | 2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013052361-A |
| titleOfInvention | Chemical bath deposition equipment |
| abstract | As a buffer layer of a photoelectric conversion element, a buffer layer with higher quality is obtained at low cost. In a chemical bath deposition apparatus 1, a reaction tank 3 for storing a reaction liquid 2 for depositing a film on a film formation surface 10a of a film formation substrate 10 and a back surface of the film formation substrate 10 are provided. A substrate holding portion 20 that has a fixing surface 21a made of stainless steel that is closely fixed and holds the film-forming substrate 10 so that at least the film-forming surface 10a is in contact with the reaction solution 2; A heater 30 mounted on the back side of the fixed surface 21a, which is heated from the side, and a reaction liquid temperature control unit 40 for controlling the temperature of the reaction liquid 2 in the reaction tank 3 are provided. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109650734-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109161875-A |
| priorityDate | 2011-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.