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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-457
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filingDate 2011-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_562271e1e5d4e10b68b2668bd4e1768a
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publicationDate 2013-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013047361-A
titleOfInvention Sputtering target, manufacturing method thereof, thin film using the target, thin film sheet including the thin film, and laminated sheet
abstract A sputtering target suitable for forming a thin film having excellent transparency and gas barrier properties, a method for producing the sputtering target, a thin film using the target, a thin film sheet including the thin film, and a laminated sheet are provided. The sputtering target of the present invention is composed of a sintered body mainly composed of zinc oxide (ZnO) and tin oxide (SnO 2 ), and the sintered body has a relative density of 95% or more. The molar ratio of (ZnO) to tin oxide (SnO 2 ) is 15:85 to 90:10. [Selection] Figure 1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015189011-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019183244-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019202819-A1
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priorityDate 2011-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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