http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013034026-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
filingDate 2012-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c07cd9c26d2f25f853b8e6045af989b
publicationDate 2013-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013034026-A
titleOfInvention Polishing composition and method for producing semiconductor wafer using the same
abstract A polishing composition capable of reducing the number of LPDs resulting from polishing on the surface of an object to be polished after polishing with the polishing composition and a method for producing a semiconductor wafer using the same are provided. To do. The polishing composition of the present invention is a polishing composition used for silicon preliminary polishing, and when a specific silicon wafer is subjected to the following polishing operation, polishing processing per wafer surface is performed. The number of LPDs resulting from is less than 30. (1) Pre-polishing step using polishing composition, (2) Final polishing using final polishing composition, and further measuring the first LPD after SC-1 cleaning and isopropyl alcohol vapor drying. Step (3) After the wafer is further SC-1 cleaned and isopropyl alcohol vapor dried, the second LPD is measured, and then the number of LPDs whose measurement positions do not change between the first and second LPD measurements is defined as the number of LPDs. The process of measuring. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016035250-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016053114-A
priorityDate 2012-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24777
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415712574
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15025
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419513193
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15913
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415745154
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453715328
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449266279
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82764
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83191
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452505745
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID30081
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419513958
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411285921
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3776
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70088

Total number of triples: 31.