http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013030567-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-153
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2011-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c38f2b4cb52c3aa453e6b6784f5f9e0
publicationDate 2013-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013030567-A
titleOfInvention Charged particle beam lens array
abstract A charged particle beam lens array capable of correcting aberration of a charged particle beam caused by charging of an insulator surface constituting the charged particle beam lens array is provided. A charged particle beam lens array for controlling the optical characteristics of a plurality of charged particle beams emitted from a charged particle source is supported by being spaced apart from each other in the direction of an optical axis 3 via insulators 2A and 2B. It has a plurality of electrodes 1A, 1B, 1C. The electrode has a plurality of through holes 4 through which the charged particle beam 5 passes. The arrangement of the plurality of through holes is shifted from the respective reference positions 8 defined by the two translation vectors in a direction for correcting the aberration of the charged particle beam generated in the charged particle beam lens array. The shift amount of each through hole from the reference position is larger as the reference position is closer to the insulator surfaces 6A and 6B, and is smaller as the distance from the insulator surface is increased. [Selection] Figure 1
priorityDate 2011-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 17.