| abstract |
Thin film amorphous, single crystal or polycrystalline silicon wafer substrate for use in photovoltaic cells, the wafer substrate having at least one of a pn or np junction and a partial phosphosilicate or borosilicate glass layer on the top surface of the wafer substrate To increase at least one of (a) the sheet resistance of the wafer and (b) the power density level of the photovoltaic cell made from the wafer. Having at least one tetraalkylammonium hydroxide, acetic acid, at least one nonionic surfactant, at least one metal chelator, a metal-free source of ammonia, a metal-free source of fluoride ions and water A treatment solution, which is an acid treatment solution in which a buffered oxide etch (BOE) solution is mixed with an oxidant solution and optionally water. |