| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H02N13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2009-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012502478-A |
| titleOfInvention |
Wafer processing apparatus with adjustable electrical resistivity |
| abstract |
Articles with a coating having etch resistance are disclosed. The article is a heating element or wafer carrier or electrostatic chuck. The article has a base substrate formed from a ceramic or other material and one or more electrodes for resistive heating or electromagnetic chucks or both. Etch-resistant coatings have multiple regions formed from materials that have different volume resistivity from one another, thereby enabling the bulk resistance to be adjusted by changing the relative size of each region as a whole. Have a rate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9401403-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014041736-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107919312-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102119867-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102478514-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170005113-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020524898-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014041736-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150045670-A |
| priorityDate |
2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |