http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012502179-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45582 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45508 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45531 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4411 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2009-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012502179-A |
| titleOfInvention | In situ chamber processing and deposition processes |
| abstract | Embodiments of the present invention provide a method for treating the inner surface of a processing chamber and depositing material during a vapor deposition process such as atomic layer deposition (ALD) or chemical vapor deposition (CVD). In one embodiment, the inner surface of the processing chamber and the substrate can be exposed to a reagent such as a hydrogenated ligand compound during the pretreatment process. This hydrogenated ligand compound can be the same ligand as the free ligand formed from the organometallic precursor used during the subsequent deposition process. This free ligand is usually formed by hydrogenation or pyrolysis during the deposition process. In one example, the processing chamber and substrate are subjected to a pretreatment process prior to performing a vapor deposition process utilizing an organometallic chemical precursor having an alkylamino ligand such as pentakis (dimethylamino) tantalum (PDMAT). Exposure to an alkylamine compound (eg, dimethylamine). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101811680-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016184684-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017505983-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015224227-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015021175-A |
| priorityDate | 2008-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 409.