http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012254968-A

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filingDate 2012-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012254968-A
titleOfInvention Condensate, photosensitive composition, method for producing the same, and method for forming negative resist pattern using the same
abstract Alkali silane hydrolyzate, which has a storage stability and is capable of obtaining a film having a pencil hardness of HB or higher and having no film thickness even when the film thickness is 1.5 μm or more when heated and fired. Condensates obtained by decomposition and condensation reactions are provided. An alkoxysilane A represented by general formula (1): Si (OR 1 ) 4 and an alkoxysilane B represented by general formula (2) :( R 2 ) Si (OR 1 ) 3 The alkoxysilane C represented by the formula (3) :( R 2 ) 2 Si (OR 1 ) 2 is represented by a molar ratio, and alkoxysilane A: alkoxysilane B: alkoxysilane C = 0 to 70:30 to 100: Condensate of alkoxysilane condensed in the range of 0-70. (R 1 is a methyl group or an ethyl group, and R 2 is a methyl group, an ethyl group, or a phenyl group.) [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015146804-A1
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