http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012254958-A

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filingDate 2011-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3652fe23b9913d08b284410a7de2b31
publicationDate 2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012254958-A
titleOfInvention Composition of nail polish remover
abstract A nail polish remover composition comprising gamma butyrolactone is provided. The present invention relates to a composition for a nail polish remover. Whereas the known nail polish remover containing acetone emits a nose irritating odor and has the disadvantage of corroding and damaging the nail when removing the nail polish, the composition of the present invention is a percentage by weight. Comprising 10% to 95% gamma-butyrolactone, water having a weight percentage of 2.3899% to 52.9%, and an additive having a weight percentage of 2.6101% to 37.1%. The component for removing nail polish mainly includes gamma-butyrolactone (γ-butyrolactone). Gamma-butyrolactone (γ-butyrolactone) has no irritating nose and rarely damages the nails, and thus provides a new nail polish remover. [Selection] None
priorityDate 2011-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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