| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f00b304bd547a0fac0f03948f2310cbb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10b9845da719074d94bccfec34444a3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43 |
| publicationDate |
2012-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012242800-A |
| titleOfInvention |
Positive resist composition and resist pattern forming method |
| abstract |
A positive resist composition capable of reducing defects and a resist pattern forming method using the resist composition are provided. A substrate component (A) whose solubility in an alkaline developer is increased by the action of an acid, an acid generator component (B) which generates an acid upon exposure, a fluorine-containing compound component (F), and a photosensitizer. The positive resist composition containing (G); the fluorine-containing compound component (F) is derived from an acrylate ester in which an atom other than a hydrogen atom or a substituent may be bonded to the α-position carbon atom. It is preferable to contain a resin component (F1) which is a structural unit and has a structural unit (f1) containing a fluorine atom; the structural unit (f1) is a structural unit represented by the formula (f1-1) Is preferred. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190026879-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015022779-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11584810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200110439-A |
| priorityDate |
2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |