http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012242799-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D313-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate | 2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5629ea1962b41d0773eaf45e8af40283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 |
| publicationDate | 2012-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012242799-A |
| titleOfInvention | Resist composition, resist pattern forming method, novel compound, acid generator |
| abstract | The present invention provides a resist composition excellent in lithography characteristics and pattern shape, a resist pattern forming method using the resist composition, a novel compound useful as an acid generator for the resist composition, and an acid generator. A resist composition comprising a base material component (A) whose solubility in a developing solution is changed by the action of an acid and an acid generator component (B) that generates an acid upon exposure, wherein the acid generation The agent component (B) contains an acid generator (B1) having a group represented by the formula (b1-1) in the cation part [wherein R ′ has 1 carbon atom. -6 alkyl group, C1-C6 alkoxy group, C1-C6 halogenated alkyl group, halogen atom, hydroxyl group, -COOR ", -OC (= O) R", hydroxyalkyl group or cyano group R ″ is a hydrogen atom or an alkyl group, and p is an integer of 0 to 4.] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I747946-B |
| priorityDate | 2011-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 370.