| abstract |
The present invention provides a photosensitive film having a sufficiently high peelability from a support film of a photosensitive layer made of a photosensitive resin composition and capable of forming a resist pattern having no defects. The photosensitive film of the present invention is a photosensitive resin composition comprising a support film having at least one surface release-treated, a phenol resin, a 1,2-quinonediazide compound, and a fluorosurfactant. And a protective film are laminated in this order, and the photosensitive layer is formed on the release-treated surface of the support film. [Selection] Figure 1 |