| abstract |
The present invention provides a salt, an acid generator, a resist composition, and the like capable of obtaining a resist pattern having an excellent focus margin. A salt represented by formula (I), an acid generator containing the salt, and a resist composition. [Wherein, Q 1 and Q 2 each independently represent a fluorine atom or a C 1-6 perfluoroalkyl group; L 1 represents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms; —CH 2 — contained in the saturated saturated hydrocarbon group may be replaced by —O— or —CO—; W is a group represented by the formula selected from the formulas (W1) to (W5) Z 1+ represents an organic counter ion. ] [Selection figure] None |