http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012193068-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-14
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filingDate 2011-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18400295a7c036340509ea6a437bab31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2454a938c1cc59984663343728f9a98a
publicationDate 2012-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012193068-A
titleOfInvention Method for producing high-purity cupric oxide fine powder and method for supplying copper ion in aqueous copper sulfate solution
abstract PROBLEM TO BE SOLVED: To provide high-purity cupric oxide fine powder having high purity of copper oxide and high solubility in a plating solution and a method for producing the same, and to electroplating copper using the high-purity cupric oxide powder. Provided is a method for supplying copper ions to an aqueous copper sulfate solution to be used. SOLUTION: A method for producing high-purity cupric oxide fine powder, which uses flaky copper powder as a raw material, and pulverizes cupric oxide coarse powder obtained by heat treatment from the flaky copper powder, comprising oxygen A step of obtaining a cupric oxide coarse powder by primary heat treatment in a containing atmosphere; a step of obtaining a primary heat treated cupric oxide fine powder by pulverizing the cupric oxide coarse powder; And a secondary heat treatment of the copper fine powder in an oxygen-containing atmosphere. [Selection] Figure 2
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103663539-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014114472-A
priorityDate 2011-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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