http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012185360-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C271-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2011-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5276df32939cc6406bb685093f510e66 |
publicationDate | 2012-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2012185360-A |
titleOfInvention | Resist composition and method for producing resist pattern |
abstract | An object of the present invention is to provide a resist composition capable of forming a resist pattern with a good exposure margin (EL). A resist composition containing a resin, an acid generator, a compound represented by formula (I), and a solvent, and a method for producing a resist pattern. [Wherein, R 1 represents an optionally substituted aliphatic hydrocarbon group having 1 to 30 carbon atoms or an optionally substituted aromatic hydrocarbon group; R 2 and R 3 Each independently represents a hydrogen atom, an optionally substituted aliphatic hydrocarbon group having 1 to 30 carbon atoms, or an optionally substituted aromatic hydrocarbon group, or R 2 or R 3 is bonded to R 1 to form a ring; R 4 is a hydrogen atom, an optionally substituted aliphatic hydrocarbon group or substituent having 1 to 20 carbon atoms Represents an aromatic hydrocarbon group which may have ] [Selection figure] None |
priorityDate | 2011-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 230.