http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012182166-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2011-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c90f1648b166f18234e6c6782102a9c7 |
| publicationDate | 2012-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012182166-A |
| titleOfInvention | Quartz top plate for plasma nitriding apparatus and plasma nitriding apparatus |
| abstract | A quartz top plate for a plasma nitriding apparatus capable of forming a high-quality nitride film by preventing splashing of quartz fragments. According to an embodiment, a quartz top plate for a plasma nitriding apparatus is provided. A quartz top plate for a plasma nitriding device is disposed between an antenna for generating plasma in a vacuum reaction chamber of the plasma nitriding device and a plasma region in the vacuum reaction chamber and used as a top plate of the vacuum reaction chamber. A quartz top plate for a plasma nitriding apparatus includes a main plate portion formed in a plate shape using quartz, and a dense film in which at least a surface in contact with a plasma atmosphere is formed of a film denser than the quartz among the surfaces of the main plate portion. It is equipped with. The dense film is a film formed by generating a film on the main plate portion. [Selection] Figure 2 |
| priorityDate | 2011-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.