http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012172253-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_927c3131644244d81f82743c2a670aab
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
filingDate 2011-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27e5ad2f7a68ce4a65ddf5497c54dfd1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a947498465baa60526dcaacbb3e05c9f
publicationDate 2012-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012172253-A
titleOfInvention Chemical vapor deposition process
abstract In a chemical vapor deposition process in which after vaporizing a metal chloride raw material, the vaporized metal chloride raw material is reacted with a reducing gas containing hydrogen to deposit ceramics on an object. Provided is a chemical vapor deposition process that recovers lower metal chlorides that have been discarded as living organisms and returns them to their original metal chlorides for reuse. A process of extracting a lower metal chloride 6 as a solid or a liquid from an exhaust gas 5 discharged with a ceramic precipitation reaction, and a process of dissolving the lower metal chloride 6 in a water-insoluble solvent 11 Then, after heating the solution 7 in which the lower metal chloride 6 is dissolved, chlorine gas 8 is blown to return the lower metal chloride 6 to the original metal chloride 10 and reused as the metal chloride raw material 1 And further comprising a step of performing. [Selection] Figure 1
priorityDate 2011-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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