http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012158821-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3b0a3dbf8d6c9712d86ea1383fd5327
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00
filingDate 2011-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_562271e1e5d4e10b68b2668bd4e1768a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39484a3a19f976aec5b46fadbba446af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1235fc35c0af14241c8191692f32b08f
publicationDate 2012-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012158821-A
titleOfInvention Thin film production method and thin film forming vapor deposition material, thin film obtained by the method, thin film sheet comprising the thin film, and laminated sheet
abstract A method for producing a thin film having excellent transparency and gas barrier properties, a vapor deposition material for co-evaporation suitable for forming the thin film, a thin film obtained by the method, a thin film sheet including the thin film, and a laminated sheet are provided. A method for producing a thin film according to the present invention uses a sublimable vapor deposition material made of a first oxide and a sublimation vapor deposition material made of a second oxide different from the first oxide, to form a vacuum film. An oxide thin film composed of a first oxide and a second oxide is formed on a substrate by a co-evaporation method in which vapor deposition is simultaneously performed by a method. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016216804-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017151408-A
priorityDate 2011-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.