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filingDate 2012-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d39669cab44adbf5ecd73f4ea29d99db
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publicationDate 2012-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012151517-A
titleOfInvention Manufacturing method of semiconductor optical device
abstract An object of the present invention is to provide a method of manufacturing a semiconductor optical device in which deterioration of characteristics and reliability of the semiconductor optical device are suppressed. A method of manufacturing a semiconductor optical device according to the present invention includes an active layer forming step for forming an active layer, and an active layer protective film for forming a phosphorous III-V semiconductor layer after the active layer forming step. And a silicon-based film forming step of forming a silicon oxide-based or silicon nitride-based film after the active layer protective film forming step. [Selection] Figure 1
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