| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
| filingDate |
2011-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2be8c1d8302d6fb84663820906c7f02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36616a7dfdb0a7e59c6f4b808e61f918 |
| publicationDate |
2012-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012137750-A |
| titleOfInvention |
Resist composition |
| abstract |
A resist composition capable of producing a resist pattern having excellent resolution is provided. A resin having an acid labile group and insoluble or hardly soluble in an alkaline aqueous solution and soluble in an alkaline aqueous solution by the action of an acid, an acid generator, and a compound represented by the formula (I): A resist composition, which is a resin having a structural unit derived from a monomer represented by formula (a2-0). [R 1 to R 4 represent an alkyl group, a saturated cyclic hydrocarbon group or an alkenyl group which may have a substituent. A 1 represents a halogenated alkyl group. ] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102019688-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013062080-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014123105-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160069510-A |
| priorityDate |
2010-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |