| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition capable of achieving both suppression of elution of a photoacid generator into immersion water and excellent immersion liquid followability, and also having excellent roughness characteristics, and To provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the same. SOLUTION: (A) A compound that generates an acid represented by the following general formula (I) upon irradiation with actinic rays or radiation, and (B) decomposition by the action of an acid, increasing solubility in an alkali developer. An actinic ray-sensitive or radiation-sensitive resin composition containing a resin to be used. (In general formula (I), n represents an integer of 2 or more, and X represents a hydrocarbon group.) [Chemical 1] [Selection figure] None |