http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012134325-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2010-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b3a8a89eb36dd8476f09af14ab10858
publicationDate 2012-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012134325-A
titleOfInvention Substrate processing apparatus and substrate manufacturing method
abstract An object of the present invention is to further reduce the risk of explosion caused by leakage of processing gas and reliably prevent damage to an apparatus caused by explosion. An inert gas is supplied to a gap SP3 between a housing case 290 and a surrounding member 280 and a gap SP4 between the surrounding member 280 and a processing furnace 202, and the inert gas in the gap SP4 is directly supplied. Thus, the inert gas exhaust pipe 291 is reached through the connection hole 284, and the inert gas in the gap SP 3 wraps around the inside of the surrounding member 280 through the opening 283 of the surrounding member 280 and is inert from the connection hole 284. The gas exhaust pipe 291 is reached. As a result, the inert gas can be spread to every corner of the storage casing 290, and the processing gas leaked in the heater chamber HR can be diluted almost completely without being retained and discharged outside. Therefore, it is possible to further reduce the risk of explosion caused by the leakage of the processing gas and reliably prevent damage to the substrate processing apparatus 101 caused by the explosion. [Selection] Figure 8
priorityDate 2010-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 19.