| abstract |
An object of the present invention is to form a resist film that can suppress the occurrence of defects due to poor development while improving the hydrophobicity of the film surface during immersion exposure, and has excellent lithography performance. The polymer component contains a repeating unit (a1) represented by the following formula (1), the formula (F1-1), the formula (F1-2) and the formula ( There is provided a radiation-sensitive resin composition having at least one repeating unit (f1) selected from the group consisting of repeating units represented by F1-3). [Selection figure] None |