| abstract |
Provided is a photosensitive resin composition having a short development time and a good pattern shape. A photosensitive resin composition containing a polyimide precursor having a structure represented by the following formula (1) and a photobase generator. (In the formula (1), R1 is a tetravalent organic group, R2 is a divalent organic group, R3 is a hydrogen atom or a monovalent organic group, and R4 is selected from the group consisting of a hydrogen atom or an organic group having a specific structure. And at least a part of R4 is an organic group, and a plurality of R1, R2, R3, and R4 may be the same or different.) [Selection figure] None |