| abstract |
Disclosed is a negative photosensitive resin composition that is excellent in pattern processability, has high hardness and high transparency by UV curing and thermal curing, and gives a cured film having excellent chemical resistance, and is capable of alkali development. (A) An alkali-soluble resin having a carboxyl group (B) a photoradical polymerization initiator, (C) a polyfunctional monomer, and (D) any one or more of the following formulas (1) to (3) A negative photosensitive resin composition containing a silane coupling agent having a functional group, wherein (A) an alkali-soluble resin having a carboxyl group is (a-1) a polysiloxane having a carboxyl group and a radical polymerizable group And / or (a-2) a negative photosensitive resin composition which is an acrylic resin obtained by reacting an acrylic resin having a carboxyl group with a monosubstituted epoxy compound having a radical polymerizable group. [Selection figure] None |