| abstract |
To provide a resist composition that is stable to a solvent used in an immersion lithography process and has excellent sensitivity and resist pattern profile shape. (A1) a structural unit derived from a (meth) acrylic acid ester having an acid dissociable, dissolution inhibiting group, (a2) a structural unit derived from a (meth) acrylic acid ester having a lactone unit, and ( a4) a structural unit derived from a (meth) acrylic acid ester having a polycyclic group, and (a0) (a0-1) a dicarboxylic acid anhydride-containing structural unit and (a0-2) a phenolic hydroxyl group Dissolves the resin component (A) that does not have a constituent unit and increases alkali solubility by the action of an acid, the acid generator component (B) that generates acid upon exposure, the component (A), and the component (B) A positive resist composition comprising an organic solvent (C) and a nitrogen-containing organic compound (D). [Selection figure] None |