| abstract |
An object of the present invention is to provide a resist composition capable of obtaining a pattern having an excellent mask error enhancement factor (MEEF). A polymer (1) or a polymer (2) (which contains a monomer-derived structural unit of the formula (I)), an acid-labile group, and insoluble or sparingly soluble in an alkaline aqueous solution. A resist composition comprising a resin that can be dissolved in an alkaline aqueous solution by the action of an acid, and an acid generator. [Wherein, R 1 represents a hydrogen atom or a methyl group; R 2 and R 3 each independently represent a hydrocarbon group or are bonded to each other to form a ring, and the group includes a halogen atom, a nitro group, It may be substituted with a hydroxyl group or a cyano group, and —CH 2 — contained in the group may be replaced with —O—, —CO—, —SO 2 — or —NH—, and the hydrocarbon ═CH— contained in the group may be replaced by ═N—; A 1 represents a single bond or a divalent linking group. ] [Selection figure] None |