Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C67-343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-736 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2011-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_811c9e6e856f6d34daba788e2d6e8199 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1108117c8ba75da9b109979a2012b66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2be8c1d8302d6fb84663820906c7f02 |
publicationDate |
2012-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2012077071-A |
titleOfInvention |
Compound and resist composition |
abstract |
A novel compound contained in a resist composition capable of obtaining a pattern having excellent line edge roughness is provided. For example, a compound represented by the formula (III-2) obtained by reacting a compound represented by the formula (I-1) with a compound represented by the formula (II-2). [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013024778-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013024778-A1 |
priorityDate |
2010-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |