http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012073553-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72 |
| filingDate | 2010-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6844bc2f48ae4fcdda0d4244810ec4d2 |
| publicationDate | 2012-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012073553-A |
| titleOfInvention | Photomask defect correction method, photomask manufacturing method, photomask, and pattern transfer method |
| abstract | A defect correcting method capable of accurately correcting a defect generated in a fine pattern that is difficult to be corrected by a correcting device. A photomask defect in which a surplus defect generated in a photomask having a light-transmitting part and a light-shielding part formed by patterning a light-shielding film formed on a transparent substrate is corrected by using a defect correction apparatus. It is a correction method. A film removing step of simultaneously removing a surplus defect in the light transmitting portion and a part of the light shielding film of the light shielding portion adjacent to the light transmitting portion having the surplus defect, and a light shielding in the light shielding portion removed in the film removing step Forming a correction film having a light-shielding property equivalent to that of the light-shielding film in a region including a part of the film, and the film formation performed in the film formation process is performed by a single correction operation by the defect correction device This is performed for the light-shielding portion having a width larger than the minimum film formation width that can be formed by the above. [Selection] Figure 3 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019003203-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102736405-A |
| priorityDate | 2010-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.